The semiconductor industry makes extensive use of Carbon Tetrafluoride (CF4) due to its stable, inert properties. It's a critical component in plasma etching, a process used to create intricate patterns on semiconductor materials.

Plasma etching involves creating a high-energy plasma, or ionized gas, that can selectively etch patterns into a material. CF4 is often used in this process as its fluorine atoms can be readily ionized and directed to etch away specific materials. The inertness of CF4 allows it to withstand the high-energy environment of the plasma without reacting or decomposing.

Despite its benefits, the use of CF4 in the semiconductor industry has environmental implications. CF4 is a potent greenhouse gas, and its use in the semiconductor industry contributes to its atmospheric concentration. The industry is exploring alternatives and better management practices to reduce the environmental impact.